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Electron Interactions with Plasma Processing Gases

Presented here are electron-collision cross section data and electron transport coefficients for gases used in the manufacturing of semiconductor devices. These data were derived from a detailed assessment, analysis, and review of available electron collision data for each gas. The data presented here represent a "recommended" set of data based upon the most reliable data available in the literature. A detailed description of all available data and an explanation of the derivation of the data set presented here can be obtained from the source(s) listed with each table of data.

The purpose of this web site is to provide a complete, yet concise, set of reliable electron collision data for gases used in the plasma processing of semiconductor devices. This project is a service of the National Institute of Standards and Technology (NIST), and is jointly sponsored by the Standard Reference Data Program (SRDP), the National Semiconductor Metrology Program (NSMP), and the Electricity Division of the Electronics and Electrical Engineering Laboratory (EEEL).

Data for the following gases are available or are being investigated. New data for additional gases will be posted as the assessment process continues.

• CF₄ - Carbon Tetrafluoride (Last updated 18 August 1999)
• CHF₃ - Trifluoromethane (Last updated 18 August 1999)
• CCl₂F₂ - Dichlorodifluoromethane (Freon 12)
• C₂F₆ - Perfluoroethane (Last updated 18 August 1999)
• C₃F₈ - Perfluoropropane (Last updated 18 August 1999, corrected 18 November 1999)
• Cl₂ - Chlorine
• SF₆ - Sulfur Hexafluoride
• CF₃I - Trifluoroiodomethane
• c-C₄F₈ - Perfluorocyclobutane (coming soon)
• BCl₃ - Boron Trichloride (coming Spring 2001)

NIST reserves the right to charge for this data in the future.

The National Institute of Standards and Technology uses its best effort to deliver a high quality copy of the database and to verify that the data contained therein have been selected on the basis of sound scientific judgement. However, NIST makes no warranties to that effect, and NIST shall not be liable for any damage that may result from errors or omissions in the database.

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