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DOE labs advance lithography
Consumers have come to expect computers to get faster, cheaper and more powerful every few months. Unless something is done soon, though, such steady boosts may get harder to come by. One way manufacturers improve computer performance is by cramming more circuits onto computer chips, the brains of the machine. The problem is, current technology for printing circuitry is nearing the limit for how many circuit lines it can place on a chip. Enter Extreme Ultraviolet Lithography (EUVL), a technology that uses very short wave lengths of light to print circuits. EUVL can put more lines on a chip than current technology by making the lines thinner-down to a thickness of one four-hundredth the width of a human hair. Enter now a unique "Virtual National Laboratory" of researchers pulled from DOE's Lawence Livermore, Lawrence Berkeley and Sandia National Laboratories who have teamed with semiconductor giants Intel, Advanced Micro Devices, Motorola and Micron to develop EUVL as the next-generation lithography technique. Progress has been so gooda prototype EUVL system is expected early next yearthat the semiconductor consortium International SEMATECH recognized EUVL as the leading candidate to replace conventional lithography technology. "The semiconductor industry has given our project very high marks," said James Glaze, head of the Virtual National Laboratory. "There are other, competing technologies out there, but it appears we're in front." Glaze, formerly vice president for Technology with the Semiconductor Industry Association, credits the unique collaboration of "Virtual National Lab" researchers and industrial experts for the project's success. "This is really a model for how government and industry can work together to meet national challenges," said Glaze. "We've shown you can bring together talented individuals from different institutions and business cultures and build teams that can solve problems with national and global impact." Submitted by DOE's Lawrence Livermore National Laboratory
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